EP-Replayer.

Data replay for predictive End Point and process optimization

Semiconductor manufacturing cleanroom
EP-Replayer · Thin films, plasma and surface engineering

Overview.

The Hiden EP-Replayer enables IMP-EPD users to replay previous etch data, helping to create and optimize End Point recipes. By defining variables in the algorithmic recipe template, users can simulate and refine End Point detection in real-time.

The Hiden EP-Replayer is an essential tool for IMP-EPD users, enabling precise playback of previous etch data to fine-tune and optimize End Point detection recipes. By defining variables in the algorithmic recipe template, users can replay recorded data in real time, visualizing the expected End Point for given parameters.

Just like live data acquisition, the Events Log tracks timestamps, state changes, and key count rates, while the Chart Marker graph displays the End Point progression. This allows users to test and refine different End Point detection methods and leverage advanced recipe template features—all with minimal wafer consumption. This builds a more robust, repeatable, and cost-effective etch process.

Designed for effortless integration with HAL10 IMP-EPD installations, the EP-Replayer simplifies the conversion of MASsoft data into replay-compatible files. Users can easily adjust End Point recipes through MASsoft, optimizing detection accuracy and process efficiency.

Optionally the EP-Replayer can be operated independently from the etch tool, ensuring uninterrupted workflow efficiency. This flexibility allows users to refine their recipes without disrupting live processes—enhancing both convenience and productivity.

Typical applications

End point analysis

Key Features.

  • Real-time reprocessing of previous etch data.
  • End Point calculated and displayed in MASsoft.
  • Optimize recipes from one initial etch – Save time and resources by refining your process parameters based on just a single etch.
  • Trial more advanced End Point methods and algorithm features.
  • Reduce risk of failed End Points and scrapped wafers – Minimize costly errors and material waste with improved detection and process optimization.
  • Adjust End Point parameters and replay to troubleshoot without additional etches – Fine-tune settings and diagnose issues efficiently without consuming extra wafers.

Software.

Every system ships with control software. Which package suits depends on whether you are running quantitative gas analysis, evolved gas work, or building your own acquisition routines.

Related instruments.

  • IMP-EPD

    A differentially pumped, ruggedized secondary ion mass spectrometer for end point detection in the ion beam etch process.

  • EQS

    A system for the analysis of secondary positive and negative ions from solid samples

  • PSM

    A mass and energy analyzer for plasma diagnostics

Talk to an applications engineer.

Describe the experiment. An applications engineer reads it personally and typically replies within one business day.

Or call 1-888-96-HIDEN, Monday to Friday, 8:30am to 5pm ET.