Thin films, plasma and surface engineering.
Measuring the ions, radicals and neutrals inside plasma and thin film processes.
Instruments.
18 in this area
HPR-30 Series
Vacuum process gas analyzers designed for fast response, high sensitivity analysis of gas and vapor species in vacuum processes.
Plasma studiesFreeze dryingCVD/MOCVD/ALD+2 more
HPR-60 MBMS
A compact skimmer inlet molecular beam mass spectrometer for the analysis of reactive gas phase intermediates.
Plasma characterizationGas reaction kineticsEnvironmental studies+5 more
HMT
A dual mode RGA system for vacuum diagnostics and process monitoring
Residual gas analysisVacuum processingNear atmospheric XPS, APXPS+2 more
EQP Series
A quadrupole mass spectrometer series for direct analysis of plasma ion mass and energy, measuring ions, neutrals and radicals from plasma.
Analysis of ions and radicalsEtching and deposition studiesIon implantation+11 more
PSM
A mass and energy analyzer for plasma diagnostics
Plasma CharacterizationPlasma Etching and ALEHiPIMS+3 more
ESPion
An advanced Langmuir probe for plasma diagnostics, measuring electrical properties of plasmas such as plasma potential, floating potential and electron temperature.
Plasma characterizationPlasma potentialFloating potential+4 more
IMP-EPD
A differentially pumped, ruggedized secondary ion mass spectrometer for end point detection in the ion beam etch process.
End point analysisTarget impurity determinationQuality control and SPC+5 more
EP-Replayer
Data replay for predictive End Point and process optimization
End point analysis
XBS
A quadrupole mass spectrometer for monitoring multiple beam sources simultaneously, serving as a deposition rate monitor for molecular beam analysis and deposition control.
MBE monitoring and controlMolecular beam studiesMultiple beam source analysis+5 more
TDSLab Series
UHV chamber with load lock and a HAL/3F PIC triple filter mass spectrometer. Heats to 1000°C at up to 40°C/min, and is designed for thin wafer-type samples. TPDsoft is standard.
SIMS Workstation
High performance static and dynamic SIMS for surface composition analysis and depth profiling, with SNMS for quantification in thin film measurements.
CatalysisSurface analysisThin film and surface engineering+3 more
ToF-qSIMS Workstation
A time of flight quadrupole SIMS system offering static ToF-SIMS capabilities and high dynamic range depth profiling from the quadrupole SIMS.
Surface analysisThin film and surface engineeringSurface science+5 more
Compact SIMS
A SIMS tool designed for fast and reliable characterization of layer structures, surface contamination and impurities, with sensitive positive ion detection.
Solar cellsGlass coatingMetallic thin films
AutoSIMS
A self-contained automated SIMS tool for routine and repetitive surface analysis of thin films, contamination and doping, in conductive and insulating material.
Thin filmsSurface modificationCoating+4 more
EQS
A system for the analysis of secondary positive and negative ions from solid samples
FIB-SIMS for Nano-Scale Materials AnalysisBattery ResearchNuclear Materials+2 more
MAXIM
A system for static and dynamic SIMS and SNMS applications
Surgical StentFlexible Solar Cell
IG5C
A 5keV Cesium ion gun for UHV surface analysis applications
Thin Films Optical CoatingElectronic Materials
IG20
A 5keV Argon or Oxygen ion source for UHV surface analysis applications
Thin Films Optical CoatingElectronic MaterialsNuclear Materials