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Plasma and thin film process monitoring.

Instruments.

6 in this area

  • Hiden EQP Series

    EQP Series

    A quadrupole mass spectrometer series for direct analysis of plasma ion mass and energy, measuring ions, neutrals and radicals from plasma.

    Analysis of ions and radicalsEtching and deposition studiesIon implantation+11 more
  • Hiden ESPion

    ESPion

    An advanced Langmuir probe for plasma diagnostics, measuring electrical properties of plasmas such as plasma potential, floating potential and electron temperature.

    Plasma characterizationPlasma potentialFloating potential+4 more
  • Hiden IMP-EPD

    IMP-EPD

    A differentially pumped, ruggedized secondary ion mass spectrometer for end point detection in the ion beam etch process.

    End point analysisTarget impurity determinationQuality control and SPC+5 more
  • Hiden XBS

    XBS

    A quadrupole mass spectrometer for monitoring multiple beam sources simultaneously, serving as a deposition rate monitor for molecular beam analysis and deposition control.

    MBE monitoring and controlMolecular beam studiesMultiple beam source analysis+5 more
  • Hiden HPR-60 MBMS

    HPR-60 MBMS

    A compact skimmer inlet molecular beam mass spectrometer for the analysis of reactive gas phase intermediates.

    Plasma characterizationGas reaction kineticsEnvironmental studies+5 more
  • PSM plasma mass and energy analyzer

    PSM

    A mass and energy analyzer for plasma diagnostics

    Plasma CharacterizationPlasma Etching and ALEHiPIMS+3 more