5 keV
Beam energy
Key Features.
- Air stable ion source
- Small mounting flange for flexible installation
- Easy installation of self aligning replacement sources
- Long source lifetime
- Differential pumping to maintain true UHV chamber pressure
- Two lens column design
- Easy replacement of beam defining aperture
Downloads.
Hiden's published documents for this instrument.
Related instruments.
EQS
A system for the analysis of secondary positive and negative ions from solid samples
IG20
A 5keV Argon or Oxygen ion source for UHV surface analysis applications
SIMS Workstation
High performance static and dynamic SIMS for surface composition analysis and depth profiling, with SNMS for quantification in thin film measurements.
Talk to an applications engineer.
Describe the experiment. An applications engineer reads it personally and typically replies within one business day.
Or call 1-888-96-HIDEN, Monday to Friday, 8:30am to 5pm ET.