Home / Plasma and thin film process monitoring / PSM

PSM.

A mass and energy analyzer for plasma diagnostics

510 amu
Maximum mass range
7 decades
Detector dynamic range
100 eV
Energy analysis by pole bias scanning
Request a quote
Talk to an engineer
PSM plasma mass and energy analyzer
PSM · Thin films, plasma and surface engineering

Overview.

Hiden plasma probes measure some of the key plasma parameters and provide detailed information relating to plasma reaction chemistry.

A wide range of industrial processes use electrical plasmas, and new applications are developing rapidly. In the microelectronics industry the demands of higher yields and shrinking device geometries mean that process reproducibility and understanding is vital.

Detailed understanding of the reaction kinetics of plasma ions and neutral species plays a key role in the development of advanced surface engineering processes such as HIPIMS.

Typical applications

Plasma CharacterizationPlasma Etching and ALEHiPIMSDiamond-Like Carbon (DLC) CoatingPulsed Laser Deposition (PLD) CoatingsDC Magnetron Deposition of SiBCN Films

Key Features.

  • Differentially pumped manifold with mounting flange to process chamber
  • High sensitivity / stability triple filter quadrupole, mass range options to 510amu
  • Pulse ion counting detector with 7 decade dynamic range
  • Energy analysis option by pole bias scanning 100eV
  • Ion extraction / exclusion optics with tunable integral ionizer for Appearance Potential MS
  • Penning gauge and interlocks to provide over pressure protection
  • Signal gating and programmable signal gating option for time resolved studies in pulsed plasma
  • Analysis of neutrals and radicals as standard, +ve / -ve ion analysis option
  • Mu-Metal, Radio-metal shielding options, high pressure operation options
  • MASsoft control via RS232, RS485 or Ethernet LAN

Software.

Every system ships with control software. Which package suits depends on whether you are running quantitative gas analysis, evolved gas work, or building your own acquisition routines.

MASsoft Professional Mass spectrometer control software supplied with all Hiden instruments.

Downloads.

Hiden's published documents for this instrument.

Signal Gating and MCS pdf Mass Analysis of CF3I Decomposition in a Surface Barrier Discharge – GEC 2011 pdf Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures – AVS 2011 pdf Mass Spectroscopy of Metastable Species during Plasma Processing – GEC 2011 pdf Time Resolved Ionization Studies of HIPIMS – PSE 2006 pdf Low Pressure Plasma Applications Catalog pdf Mass Spectrometers for Thin Films, Plasma and Surface Engineering pdf AP0381 – Ti and Al ion irradiation during Ti1-xAlxN alloy film growth pdf AP0193 – Overcoming the geometrical limitations of conventional sputtering by controlling the ion-to-neutral ratio during high power pulsed magnetron sputtering pdf AP0027 – Preparation and Characterization of Nickel Based Catalysts for Partial Oxidation of Methane pdf

Related instruments.

  • EQP Series

    A quadrupole mass spectrometer series for direct analysis of plasma ion mass and energy, measuring ions, neutrals and radicals from plasma.

  • ESPion

    An advanced Langmuir probe for plasma diagnostics, measuring electrical properties of plasmas such as plasma potential, floating potential and electron temperature.

See all instruments

Talk to an applications engineer.

Describe the experiment. An applications engineer reads it personally and typically replies within one business day.

Email us

Or call 1-888-96-HIDEN, Monday to Friday, 8:30am to 5pm ET.