EQS.

A system for the analysis of secondary positive and negative ions from solid samples

5000 amu
Maximum mass range
0.05 eV
Energy scan increment
7 decades
Detector dynamic range
EQS electrostatic quadrupole SIMS analyzer
EQS · Surface analysis (SIMS)

Overview.

Hiden Analytical supplies world-class mass spectrometry solutions and innovative tools for ion analyses, including the tried-and-trusted Hiden EQS. This high transmission electrostatic quadrupole secondary ion mass spectrometer (SIMS) is one of our most popular detection systems for research-scale thin film nanoscale surface analysis. The EQS SIMS analyzer is an ideal add-on analyzer for XPS and focused ion beam FIB microscopy systems.

The Hiden EQS is a unique electrostatic quadrupole SIMS detector, specialized for the mass spectral analysis of both positive (+ve) and negative (-ve) secondary ions from solid samples. With its integrated 45° electrostatic sector ion energy analyzer, the Hiden EQS can simultaneously analyze ion energy with a resolution of 0.2 electron volts (eV). This makes it one of the most versatile tools for ion analyses in a raft of mass spectrometry applications, including:

  • Extending the sensitivity range of XPS by a factor of over 1000
  • Dynamic and static SIMS
  • Focused ion beam (FIB) mass spectrometry
  • Secondary neutral mass spectrometry (SNMS)
  • Sputter depth profiling
  • Sputtered ion and neutral mass/energy analysis

Tools for Ion Analysis from Hiden Analytical

A popular bolt-on fitting for after-market systems, ideal as an add-on for XPS systems and focused ion beam FIB microscopy systems for example, the Hiden EQS offers high sensitivity and optional differential pumping to meet the imaging, depth profiling, and mass spectra requirements of users in a range of applications.

Typical applications

FIB-SIMS for Nano-Scale Materials AnalysisBattery ResearchNuclear MaterialsUHV Surface ScienceLithium Ion Battery Development

Key Features.

  • High Sensitivity Pulse Ion Counting detector with 7 decade dynamic range
  • Raster Control for enhanced depth profiling and imaging with integrated signal gating
  • 45° Electrostatic Sector analyzer, scan energy at 0.05 eV increments/ 0.25eV FWHM
  • Minimum perturbation of ion flight path & constant ion transmission at all energies
  • Triple filter Quadrupole, mass options to 5000 amu
  • Penning Gauge and interlocks to provide over pressure protection
  • Differentially pumped option for use in high pressure environments
  • MASsoft control via RS232, RS485 or Ethernet LAN
  • Easily interfaced to existing systems

Software.

Every system ships with control software. Which package suits depends on whether you are running quantitative gas analysis, evolved gas work, or building your own acquisition routines.

Related instruments.

  • MAXIM

    A system for static and dynamic SIMS and SNMS applications

  • IG20

    A 5keV Argon or Oxygen ion source for UHV surface analysis applications

  • SIMS Workstation

    High performance static and dynamic SIMS for surface composition analysis and depth profiling, with SNMS for quantification in thin film measurements.

Talk to an applications engineer.

Describe the experiment. An applications engineer reads it personally and typically replies within one business day.

Or call 1-888-96-HIDEN, Monday to Friday, 8:30am to 5pm ET.