EQS.
A system for the analysis of secondary positive and negative ions from solid samples
Key Features.
- High Sensitivity Pulse Ion Counting detector with 7 decade dynamic range
- Raster Control for enhanced depth profiling and imaging with integrated signal gating
- 45° Electrostatic Sector analyzer, scan energy at 0.05 eV increments/ 0.25eV FWHM
- Minimum perturbation of ion flight path & constant ion transmission at all energies
- Triple filter Quadrupole, mass options to 5000 amu
- Penning Gauge and interlocks to provide over pressure protection
- Differentially pumped option for use in high pressure environments
- MASsoft control via RS232, RS485 or Ethernet LAN
- Easily interfaced to existing systems
Software.
Every system ships with control software. Which package suits depends on whether you are running quantitative gas analysis, evolved gas work, or building your own acquisition routines.
Downloads.
Hiden's published documents for this instrument.
Related instruments.
MAXIM
A system for static and dynamic SIMS and SNMS applications
IG20
A 5keV Argon or Oxygen ion source for UHV surface analysis applications
SIMS Workstation
High performance static and dynamic SIMS for surface composition analysis and depth profiling, with SNMS for quantification in thin film measurements.
Talk to an applications engineer.
Describe the experiment. An applications engineer reads it personally and typically replies within one business day.
Or call 1-888-96-HIDEN, Monday to Friday, 8:30am to 5pm ET.